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Products & Services

MPS1400 RIE-ICP

MPS1400 RIE/ICP

Applications:

  • Dielectric materials (SiO2, SiNx, etc.);

  • Silicon-based materials (Si, a-Si, poly-Si);

  • III-V materials (GaAs, InP, GaN, etc.);

  • Sputtered metals (Au, Pt, Ti, Ta, W, etc.);

  • Diamond-like carbon (DLC);

  • Failure Analysis;

  • ICP;

  • Metal Etching (Al, Ti, Ta, TiN, TaN);

  • Silicon (Trench & Deep Si Etch);

  • AlGaN, GaN, InP;

  • AlGaAs, GaAs.


Features:

  • PLC Control System

  • Touch Screen Interface

  • Stainless Steel Chamber

  • 160-200mm Electrode

  • Internal Gas Pod

  • Optional Loadlock

  • Water Cooled Electrode

  • Vacuum Pump Options


 

Description:

The Mini-Lab MPS1400 series of R & D single wafer processing equipment, can be designed and manufactured to suit customer specific requirements. All system components are mounted within the system mainframe ensuring that the footprint is kept to a minimum. The modular design allows different RF sources, vacuum pumping packages and electrode configurations, to be easily incorporated into the system build.


More Information:

For further information on the MPS1400 RIE/ICP system please call us on 0845 340 2626 or email our friendly team and someone will be in touch shortly.


 

 

 

Seeking Equipment for R&D and Semiconductor Production

Call 0845 340 2626 or contact us online for more information Should you require information to assist you in your Equipment Purchasing or Field Service Support, please call the number above and our friendly staff will be pleased to help.
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