Plasma Etching of the following materials:-
Dielectric materials (SiO2, SiNx, etc.);
Silicon-based materials (Si, a-Si, poly-Si);
III-V materials (GaAs, InP, GaN, etc.);
Sputtered metals (Au, Pt, Ti, Ta, W, etc.);
Diamond-like carbon (DLC);
PLC Control System
The RIE80 systems are designed to be flexible and cost effective. All system components are mounted within the frame, keeping the system footprint to a minimum. Options for ICP upgrade are also available. The system is equipped with a PLC control unit which interfaces with the operator touch screen. This control system allows manual or automatic operation, with process recipe storage and data logging.
Ethernet connection is also available for system monitoring. Systems can be configured to suit customer requirements and specific processes.
For further information on the Mini-Lab RIE80 product, please call 0845 340 2626 or email us and one of our friendly team will contact you.