R&D large area deposition or etch processing.
Stainless steel chamber;
500mm diameter electrode;
Internal chamber volume of 0.25 m3;
Substrates up to 450mm in diameter.
The Mini Lab MPS2200 series of R&D large area processing equipment can be designed and manufactured to suit customer specific requirements. All control equipment are mounted within the system mainframe ensuring that the footprint is kept to a minimum. The modular design allows different RF sources, vacuum pumping packages and electrode configurations to be easily incorporated into the system build.
For more information about this product, please call 0845 340 2626 to discuss, or email us and one of our friendly team will get back to you shortly.