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Our Principals


EM Resist

Macclesfield, UK

EM Resist Ltd. is specialised in developing materials used for electron beam lithography. With over 20 years combined experience, we are continually developing the next generation of materials that will enable you to push forward in your research and development. 

Key current products include: 

1] SML Resist. The high performance SML resist is a novel polymer that has been specifically designed to answer the demands of the EBL community. It can be simultaneously patterned into high resolution and high aspect ratio patterns, even at low acceleration voltages and without the aid of proximity effect correction.

SML resist has been specifically designed to fit in with a standard PMMA process. No change in chemistry or process traning is required.

2] PMMA Resist. Industry standard PMMA electron beam resist in Anisole. Available over a range of thicknesses and volumes. If you do not see your required product, please don't hesitate to contact  us

Available molecular weights: 950K, 495K, 120K
Cast solvent: Anisole
Thicknesses: 30 nm - 2000 nm



Products from EM Resist...

PMMA Resist
PMMA Resist

Applications: Multiple e-beam applications including lower A/R applications in: Nanoelectronics Photonics Microfluidics...

SML Resist
SML Resist

Applications: Nanoelectronics Photonics Microfluidics MEMS NEMS Zone Plates Wave...

Seeking Equipment for R&D and Semiconductor Production

Call 0845 340 2626 or contact us online for more information Should you require information to assist you in your Equipment Purchasing or Field Service Support, please call the number above and our friendly staff will be pleased to help.
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