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Products & Services

Mini Lab Sputter Pod System

Mini Lab Sputter Pod System

Description:

The Sputter Pod system is designed for R&D processes on small components and substrates up 150mm in diameter.

The Sputter Pod has an aluminium chamber with a rotating water-cooled substrate electrode accessible via the front opening door. The system is equipped with a PLC control unit which interfaces with the operator touch screen. This control system allows manual or automatic operation, which process recipe storage and data logging.

Application:

  • R&D Sputtering System

Features:

  • Small system footprint
  • Touchscreen interface
  • Two RF/ DC Magnetrons
  • Integral Gas Box
  • RF Substrate Cleaning
  • Internal Turbo Pump
  • 160mm Electrode

 

Seeking Equipment for R&D and Semiconductor Production

Call 0845 340 2626 or contact us online for more information Should you require information to assist you in your Equipment Purchasing or Field Service Support, please call the number above and our friendly staff will be pleased to help.
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