The MPS 800 Thermal Evaporation system is configured for processing wafers and substrate up to 8 inches in diameter. Heated and cooled substrate electrode with RF bias. The system is equipped with a PLC control unit which interfaces with the operator touch screen. This control system allows manual or automatic operation, with process recipe storage and data logging. Ethernet connection is also available for system monitoring. Systems can be configured to suit customer’s requirements and specific processes.