R&D single wafer sputter deposition system
Stainless steel chamber
150 - 200mm diameter electrode
Sputter down configuration
Up to 4 RF/DC magnetrons
Substrates up to 150mm in diameter or no. or wafers/ size
Optional Load Lock
The Mini-Lab MPS500 series of R & D single wafer processing equipment can be designed and manufactured to suit customer specific requirements. All control equipment are is mounted within the system mainframe ensuring that the footprint is kept to a minimum.
The chamber design allows 4 RF/DC compatible magnetrons up to 6 inches in diameter to be fitted. The system can be manufactured with Cryo or Turbo vacuum pumps.
If you have any questions, or would like to receive further information, about the Mini-Lab MPS500 System, please call us on 0845 340 2626. Alternatively, please email us and a member of our team will be in touch shortly.