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Products & Services

NANO-MASTER Electron Beam Evaporator

The Electron Beam Evaporation System can come in a compact vertical dual chamber configuration consisting of the 16” cube main chamber where platen is located and a secondary chamber for housing the e-beam source. This configuration can be provided with a gate valve between the two chambers to be used as a load lock to keep the e-beam source and the evaporation pockets in vacuum while substrate is loaded and unloaded from the main chamber. On other applications where automatic loading and unloading of wafer is needed, a third load lock chamber is attached to the left face of the cube. In this case, the main chamber can be kept at low 10-7 Torr range at all times, and wafer loading to start of the evaporation can be less than few minutes.

Seeking Equipment for R&D and Semiconductor Production

Call 0845 340 2626 or contact us online for more information Should you require information to assist you in your Equipment Purchasing or Field Service Support, please call the number above and our friendly staff will be pleased to help.
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