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Products & Services

Nitor 301

Nitor 301

Application:

  • Hot filament chemical vapour deposition


Features:

  • Water-cooled stainless steel chamber

  • Proprietary hot filament array

  • Deposition area up to 300mm

  • Vacuum load lock

  • Up to 12 gas lines

  • Optional laser interferometer for real time film thickness measurements

  • Substrate temperature range from 400 – 750°C


Description:

HFCVD—Hot Filament Chemical Vapour Deposition The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is the first of a family of systems aimed at the Photovoltaic R&D and high volume production segments.

Its modular design enables quick development of cluster tools for the deposition of silicon films from amorphous to crystalline layers, thanks to its wide substrate temperature range of 400°C to 750°C, and innovative design. 


More Information:

For further information on the Nitor 301 product, please call us on 0845 340 2626. Alternatively, please email and a member of our friendly team will be in contact shortly.


 

Seeking Equipment for R&D and Semiconductor Production

Call 0845 340 2626 or contact us online for more information Should you require information to assist you in your Equipment Purchasing or Field Service Support, please call the number above and our friendly staff will be pleased to help.
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