Hot filament chemical vapour deposition
Water-cooled stainless steel chamber
Proprietary hot filament array
Deposition area up to 300mm
Vacuum load lock
Up to 12 gas lines
Optional laser interferometer for real time film thickness measurements
Substrate temperature range from 400 – 750°C
HFCVD—Hot Filament Chemical Vapour Deposition The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is the first of a family of systems aimed at the Photovoltaic R&D and high volume production segments.
Its modular design enables quick development of cluster tools for the deposition of silicon films from amorphous to crystalline layers, thanks to its wide substrate temperature range of 400°C to 750°C, and innovative design.
For further information on the Nitor 301 product, please call us on 0845 340 2626. Alternatively, please email and a member of our friendly team will be in contact shortly.