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Products & Services

Mini-Lab Plasma-Pod System PECVD

Mini-Lab Plasma-Pod System – PECVD

Application:

  • R&D Plasma System


Features:

  • Small system footprint
  • Integral Gas Box and internal turbo pump
  • Substrates up to 125mm in diameter
  • Aluminium chamber with heated Electrode
  • Manual or automatic operation


Description:

The Plasma-Pod System is designed especially for R&D processes on small components and substrates up to 125mm in diameter. The Plasma-Pod has an aluminium chamber with a water cooled substrate electrode accessible via the pneumatically operated top electrode. The system is equipped with a PLC control unit which interfaces with the operator touch screen. This control system allows manual or automatic operation, with process recipe storage and data logging.

Ethernet connection is also available for system monitoring.  Systems can be configured to suit customer requirements and specific processes.


More Information:

If you would like to receive further information about the Mini-Lab Plasma-Pod System PECVD, please call us on 0845 340 2626. Alternatively, please email us and a member of our friendly team will be in touch shortly.


 

Seeking Equipment for R&D and Semiconductor Production

Call 0845 340 2626 or contact us online for more information Should you require information to assist you in your Equipment Purchasing or Field Service Support, please call the number above and our friendly staff will be pleased to help.
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