R&D single wafer deposition or etch processing system
Small system footprint
Heated stainless steel chamber
160 – 200mm electrode
Substrates up to 150mm in diameter
The Mini-Lab MPS1200 series of R & D single wafer processing equipment can be designed and manufactured to suit customer specific requirements. All control equipment is mounted within the system mainframe ensuring that the footprint is kept to a minimum.
The modular design allows different RF sources, vacuum pumping packages and electrode configurations to be easily incorporated into the system build.
To receive further information about the Mini-Lab MPS1200 System, please call 0845 340 2626. Alternatively, email us and one of our friendly team will be in touch shortly.